Back in 2006, University of California, Los Angeles (UCLA) engineer Patrick Pribyl had an idea for a better way to control the plasma used in chip manufacturing during the etching process.

During the etching process, a piece of silicon is placed in a chamber and immersed within a thin layer of plasma, about two centimeters wide. Also within the plasma are two electrodes spaced a ...

(Nanowerk News) Physicist Igor Kaganovich at the Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL) and collaborators have uncovered some of the physics that make possible the ...

Etching is a fundamental step in semiconductor fabrication, involving the selective removal of material from the wafer ...

Plasma Chemistry and Plasma Processing (2020). [3] Exploring the evolution of asymmetric pattern of mask hole during plasma etching process by particle simulation method. Results in Physics (2019).

Plasma Etching: A process that employs ionised gases to remove material from a substrate, typically in a directional manner, through physical and chemical interactions.

In the process of doing so, they discovered that with the right process applied to the right thickness and orientation of wood grain, the plasma treatment resulted in a surprisingly dark end result.

A research group at Nagoya University in Japan has developed a new method called “wet-like plasma etching” that combines the key features of two existing techniques: wet etching and dry ...

The project, entitled PolAR (reference 16/N0723), was funded by the Federal Ministry of Economics and Technology (BMWi) and aimed to develop a new, efficient, continuous roll-to-roll process for ...

Samsung's patent says that a dry etching apparatus using plasma is suitable for fabricating circuits with a width of 0.15 micrometers or less. The company concludes that dry etching is the ...