Technical Terms Plasma Etching: A process that employs ionised gases to remove material from a substrate, typically in a directional manner, through physical and chemical interactions.

Etching is a fundamental step in semiconductor fabrication, involving the selective removal of material from the wafer ...

The global semiconductor seals market size was valued at US$0.9 billion in 2023 and is projected to reach US$1.5 billion by 2030, witnessing a market growth CAGR of 8.1% from 2024 to 2030, according ...

Dr. Jung-Dae Kwon's research team at the Energy & Environmental Materials Research Division of the Korea Institute of ...

Discover how the EP-Replayer transforms etch process development by enabling precise recipe optimization, reducing wafer ...

Scientists developed flexible optoelectronic device using low-temperature process with minimized thin-film defects via ...

Dr. Jung-Dae Kwon's research team at the Energy & Environmental Materials Research Division of the Korea Institute of Materials Science (KIMS, President Chul-Jin Choi) has successfully developed an ...

The hardness of silicon nitride ceramics is one of its core performance indicators, usually measured by Vickers hardness (HV) ...

ACM’s patent-pending nitrogen bubbling technique provides significant wet etching uniformity improvement and enhanced cleaning performance FREMONT, Calif., July 24, 2025 (GLOBE NEWSWIRE) -- ACM ...

Technology remains at the heart of most growth opportunities. Artificial intelligence and the data centers needed to house these platforms are also key growth drivers. A handful of stocks from the ...