High aspect ratio process (HARP) and siconi process is widely used for STI gap fill in sub-65nm CMOS; it has good gap fill performance to high aspect profile. As IC technology advances to 28 nm and ...

How often are you cleaning these things in your home? It's probably not enough. Here's what needs a good scrubbing, stat!

Because it's so simple, you won't be a very busy bee if you take on this project: turning an IKEA vase into a hive-shaped lamp bedecked with bejeweled bees.

We present the design of a high-efficiency silicon nitride grating coupler with an amorphous silicon overlay. The device combines subwavelength engineering with phase apodization. We anticipate a peak ...