Modern apps require high computing resources for real-time data processing, allowing app users (AUs) to access real-time information. Edge computing (EC) provides dynamic computing resources to AUs ...

In this paper, the causes of edge over erosion (EOE) in copper CMP are investigated. Wafer patterns containing square-wave features with pattern density of 50% and line width of 0.18μm, 0.5μm, 1μm and ...