Chemical vapour deposition (CVD) techniques constitute a cornerstone of modern materials science and engineering, enabling the controlled synthesis of thin films with applications spanning ...

For example, research on silicon carbide (SiC) has confirmed that the formation of charged nanoparticles during hot-wire CVD impacts both the deposition rate and the resulting film morphology ...

Researchers at Yokohama National University (YNU) have developed a chemical vapor deposition (CVD) process that allows precursor gases to react and generate solid-state composites with ordered ...

CVD Equipment Corporation (NASDAQ: CVV), a leading provider of chemical vapor deposition and thermal process equipment, announced today that it has re ...

The PlasmaPro 100 PECVD system from Oxford Instruments has been specifically designed to produce high-quality films that exhibit outstanding uniformity and control of film properties like wet chemical ...

Deposition Technology (DepTec) was founded in 2004 to provide refurbished Varian PVD Systems, including the 3180/3190, 3290 and XM-90 systems, as well as the Novellus Concept 1 and 2 PECVD Systems.

Definition: Physical Vapor Deposition (PVD) is a sophisticated coating technology widely used to deposit thin films of materials onto various substrates. This technique involves the physical ...

This achievement, accomplished via metal-organic chemical vapour deposition (MOCVD) on a gallium nitride (GaN) substrate, introduces a novel route for precise stacking control in van der Waals ...

The group notes that plasma-enhanced chemical vapor deposition (PECVD) is the most common process used with this material, but requires both high temperatures and a vacuum.

Chemical engineers have led the development of biomedicine and biotechnology. Chemical engineering is crucial to the materials revolution, especially in computer chip manufacturing, nanotechnology, ...

Chinese researchers have used metal-organic chemical vapor deposition (MOCVD) to produce a 12 cm2, five-junction solar cell with a minimal number of mismatch dislocations. The cell has an open ...