Abstract: Rapidly increasing the yield for new process generations is crucial in achieving aggressive time-to-market requirements in semiconductor industry. As process scaling continues, subtle ...

Abstract: The design and calibration of a Near-Field Scanning Microwave Microscope (NSMM) for measurement of permittivity and loss on the small scale are described. The instrument described uses a ...

† Department of Chemistry, Faculty of Science, Masaryk University, Kamenice 5, 62500 Brno, Czech Republic ‡ RECETOX, Faculty of Science, Masaryk University, Kamenice 5, 62500 Brno, Czech Republic ...

She’s working with so-called spin defects in semiconductors, imperfections in a semiconductor’s crystal structure such as a missing atom or the insertion of a foreign atom. These defects can trap ...

† Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, Central South University, No. 605 Lushan South Road, Changsha Hunan 410012, People’s ...

A new technical paper titled “Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review” was published by researchers at KU Leuven and imec.

One of the most remarkable innovations in semiconductor manufacturing is the development of AI-powered defect detection systems. Advanced deep learning models are now being used to classify defects ...