Source: IEEE ECTC [4] Following line/space RDL build up (4 to 10µm L/S) on a glass carrier wafer, the low-k polymer (2.5) was patterned using negative-tone photoresist and i-line exposure, followed by ...

Three fast-growing niche players backed by Ashish Kacholia have posted over 20% profit growth—but pricey valuations raise ...

The integration simplifies lithography processes and leads to lower materials usage and reduced energy consumption.

Akamai Technologies Inc. (NASDAQ: AKAM) is one of the best S&P 500 stocks with huge upside potential. On June 11, Akamai Technologies announced a strategic partnership with Cloudinary. Under the new ...

Lam Research’s LRCX memory segment, accounting for both Dynamic Random Access Memory (DRAM) and Non-Volatile Memory (NVM) divisions, is gaining traction among its customers. In the third quarter of ...

In 2024, the global market size of Dry Film Photoresist was estimated to be worth USD 939 million and is forecast to reach approximately USD 1191 million by 2031 with a CAGR of 3.5% during the ...

This paper investigates the comparison of glassy carbon to that of thin carbon films as electrode substrates. It is observed that the modification of the carbon surfaces, via the electrochemical ...

Using a direct-write laser system, I created micro-scale patterns in photoresist—no masks, no cleanroom. This is how maskless lithography works for prototyping and research.

A new technical paper titled “Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined ...

FALCON by EUV Tech offers next-gen EUV resist characterization, combining automated testing with advanced analysis modules ...

This paper introduces two novel approaches to effectively eliminate the influence of scattering light from the wafer chuck and enhance the lithography precision of SU-8 photoresist on glass substrate.