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Southampton University has installed an e-beam lithography machine, the 200kV JEOL JBX-8100 G3. The tool allows processing of structures to sub-5 nm which can be achieved in thick resist – up to 10μm ...
Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan facility, according to two sources posting photographs on X social media. The ...
Even for more mature technologies (“14nm” and higher), the firm ... To build these tiny features, a lithography machine works in stages by etching patterns of transistors and metal wires ...
And to make the most cutting edge of those chips, you need an extreme ultraviolet lithography machine or an EUV machine. Brienna Hall: Pretty much everything that plugs in now has one of our chips ...
To build these tiny features, a lithography machine works in stages by etching patterns of transistors and metal wires on a wafer, layer by layer. A single wafer can contain hundreds of chips.
BOISE, Idaho—Brienna Hall has the most valuable role that you’ll never see at the most vital company that you’ve never heard of. Until she began working at ASML last year, she didn’t ...
More recently, Microsoft has incorporated artificial intelligence and machine learning into ... their ability to transition from 14nm to 10nm and then 7nm gate widths without adopting EUV (extreme ...
However, SMEE has announced that by the end of 2024, it will deliver its first 28nm lithography machine, the SSA/800-10W. Although not on par with ASML's DUV and EUV technologies, this represents ...
Credit: TSMC TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography machine by the end of 2024, according to Japanese media outlet ...
lithography at much less cost. A NIL system defines chips by stamping out photoresist patterns. Canon’s FPA-1200NZ2C NIL system for 300mm wafers enables patterning with a minimum linewidth of 14nm, ...
Canon has shipped its first ever nanoimprint lithography machine to the Texas Institute for Electronics ... enabling patterns with a minimum line width of 14nm. It claims this is equivalent to the 5nm ...