Samsung Electronics is expected to receive its first high-numerical-aperture (high-NA) extreme ultraviolet (EUV) lithography ...

ASML remains optimistic about the outlook for its extreme ultraviolet (EUV) lithography systems, including the ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...

Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...

Seoul, September 3, 2025 – SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme ultraviolet lithography (NA EUV) lithography system ...

ASML, the world's sole provider of extreme ultraviolet (EUV) lithography machines, is pressing ahead with its next-generation High-NA (numerical aperture) EUV systems—even as major chipmakers adopt a ...