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Plasma technique doubles etch rate for 3D NAND flash memoryHowever, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...
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Tech Xplore on MSNNovel transparent ceramics extend life of semiconductor etching equipmentSimilar to how a ship rusts when exposed to seawater, plasma used during the etching process continuously reacts with the internal components of the equipment, leading to corrosion and contamination.
Fig. 2: General patterning and etching process steps in a fab. Source: Wikipedia Basically, an advanced etch tool is a standalone system with a chamber. In operation, a wafer is inserted in the ...
Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...
What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
and access to the most recent ALD process advancements. Plasma ALD methods depend heavily on ions. Ions can enhance the quality of films, especially when used with nitrides and at lower deposition ...
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