Researchers have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range.

Asahi Kasei Launches New Series of Sunfort™ Dry Film Photoresist as Material for Back-End Processing of Advanced Semiconductor Packaging Used in AI Servers Asahi Kasei has developed the TA ...

FUJIFILM Corporation and imec have developed a new photoresist technology for organic semiconductors that enables the realization of submicron patterns. Due to their lightness, flexibility ...

To speed up the TPL process, highly sensitive photoresists are essential. To date, the classic SU-8 epoxy photoresist series remains a popular choice because of its numerous benefits, such as a ...

FREMONT, Calif., Jan. 14, 2025 /PRNewswire/ -- Lam Research Corporation (Nasdaq: LRCX) today announced that its innovative dry photoresist (dry resist) technology has been qualified for direct ...

This financing was led by photoresist manufacturer and existing investor, JSR Corporation. New investors included SK hynix Inc. and TSMC Partners. The round also included participation from ...

TOKYO, May 21 (Reuters) - State-backed JIC's private equity arm said its goal of driving consolidation in Japan's chipmaking sector through portfolio firm JSR is unaffected by weak financial ...

DuPont de Nemours, Inc. (NYSE:DD) announced on Friday that it has completed a major expansion of photoresist manufacturing capacity at its Sasakami site in Agano-shi, Niigata, Japan. The event ...

The intricate process of photoresist development encompasses raw material synthesis and formulation refinement, with the synthesis and purification of photoresist raw materials posing significant ...

DuPont de Nemours Inc. DD recently announced the completion of a considerable expansion of photoresist manufacturing capacity at its Sasakami Site in Agano-shi, Niigata, Japan. The event was ...