Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can now produce microelectronics containing features with a half-pitch as small as 40 nm. The big question is ...
It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography. Today's most advanced 193 nm immersion lithography systems can resolve ...
Interesting Engineering on MSN15d
China’s breakthrough solid-state deep ultraviolet laser could transform chipmakingScientists from the Chinese Academy of Sciences (CAS) have reportedly made a major ‘breakthrough’ in solid-state ...
A new solid-state laser produces 193-nm light for precision chipmaking and even creates vortex beams with orbital angular ...
For example, photolithography, which uses light to expose the photoresist, has been the workhorse of the semiconductor industry for many years. However, the size of the features it can create is ...
Tom's Hardware on MSN16d
Chinese scientists create solid-state DUV laser sources for chipmaking toolsThe Chinese Academy of Sciences has developed a light source that produces 193-nm DUV light, but it is years away from commercialization.
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