ASML will keep advancing its DUV and 0.33 NA EUV scanners. High-NA EUV lithography is expected to play a pivotal role in shrinking transistor dimensions and boosting performance.

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine.

In 2022, ASML stated that it would be able to assemble 20 High NA EUV machines per year by 2027-2028. The company has already amassed a backlog with tens of orders for the scanners, indicating ...

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year, the company's chief executive said this week. ASML's Twinscan ...

After its recent post-earnings selloff, ASML now trades at roughly 25 times earnings. That valuation doesn't scream "cheap" on the surface. But again, ASML is an extraordinary company, and that ...

ASML Holding ASML and Applied Materials AMAT are two of the biggest names in the semiconductor equipment industry, playing ...

All the breakthroughs were made using a single exposure with materials and baseline processes that have been optimized for ASML’s TWINSCAN EXE:5000 extreme ultraviolet (High NA EUV) scanner ...

"The first High-NA EUV scanner (TWINSCAN EXE:5000) has been assembled by ASML and the first wafers will be exposed soon.

ASML’s recently retired CEO Peter Wennink had predicted back in 2018 that high-NA EUV lithography would be introduced in high-volume manufacturing towards the middle of the current decade, with a ...

Rapidus is an emerging semiconductor company, using ASML EUV scanners in a facility in Japan, with 2nm production reportedly on track and ready to compete with Taiwan semiconductor giant TSMC.

Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML -imec High NA EUV Lithography Lab in Veldhoven, the Netherlands ...